SPECS UHV-XPS/SPM

Multiple methods

Name of the procedure: Multiple methods

Generic term of the process: Multiple methods

Physical Principle: Multiple methods

Scope: Spatial and surface analysis

XPS, ESCA

Name (abbreviation) of the procedure: X-Ray photoelectron spectroscopy, Electron spectroscopy for chemical analysis (XPS, ESCA)

Generic term of the process: Electron spectroscopy

Physical Principle: Generation of photelectrons via excitation with X-Ray radiation

Scope: Spatial resolution method.Uses an soft X-Ray source to generate photoelectrons to analyze the major and minor compounds. The method is speciation sensitive. Resolution and detection limits inferior to electron probe micro analysis.

Media: X-ray Photoelectron Spectroscopy

STM

Name (abbreviation) of the procedure: Scanning tunneling microscopy (STM)

Generic term of the process: Tunneling spectroscopy

Scope: Spatial resolution method. Scanning of surface structures using quantum tunneling. Normally applicable to conducting material. Resolution in the atomar range (picometer) but inferior to AFM

AFM

Name (abbreviation) of the procedure: Atomic force microscopy (AFM)

Generic term of the process: Force spectroscopy

Scope: Spatial resolution method. Scanning of surface structures using via soft contact of a nanometer-sized tip with the sample surface. Applicable for conductiong and non-conducting material. Resolution in the atomar range (picometer) but superior to STM.